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MgO (100) Epi polishing wafer 1" Dia x0.5mm, 2SP - MGa25D05C2 Muffle Furnace 38 Array (Capacity): 40*40 =1600
MgO (100) Epi polishing wafer 1" Dia x0.5mm, 2SP - MGa25D05C2 Muffle Furnace 38 Array (Capacity): 40*40 =1600
$100.80
Description
38 Array (Capacity): 40*40 =1600
powder screened to 200 MESH Melting point / Melting range 900 - 975° C SDS XRD File Package 50 grams units in a glass container
Structure: Cubic
Film Speification
MgO (100) Epi polishing wafer 1" Dia x0.5mm, 2SP - MGa25D05C2 Muffle Furnace 38 Array (Capacity): 40*40 =1600Specifications of MgO substrate Size: 1" diameter x 0. 5mm + _ 0. 05 mm Orientation: (100) + 0. 5 Deg Polish: Two sides EPI polished by CMP technology with minimum sub surface damage. Surface finish (RMS or Ra): <10A Packing: The substrate is packed with 100 grade clean plastic bag under 1000 class clean room Precautions: MgO is sensitive to moisture, and must be stored in vacuum box. Warning: MgO crystal was grown by arc melting method and nature
Shipping Notes
- Free Standard Shipping on $100+ Orders to the USA.
- Except Preorder products are shipped in 48 hours.
- Delivery to the USA:
- Standard Shipping : 3-10 business days
- If time is of the essence, please consider selecting expedited delivery for faster service.
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