78% @ 555nm Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> 78% @ 555nm Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> 78% @ 555nm Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> ITO Coated Glass Substrate 1" x 1" x 0.7 mm, R:12-15 ohm/sq, Nominal ITO film thickness: 115 (+/10%) nm Crushers & Grinders Polishing: both sides polished – golvvardarna.se

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ITO Coated Glass Substrate 1" x 1" x 0.7 mm, R:12-15 ohm/sq, Nominal ITO film thickness: 115 (+/10%) nm Crushers & Grinders Polishing: both sides polished

$13.74

Quantity
Description

Polishing:                         both sides polished

4)x10^3 cm2/Vs

Specific Capacity: 300mAh/g

g: standard gravity

ITO Coated Glass Substrate 1" x 1" x 0.7 mm, R:12-15 ohm/sq, Nominal ITO film thickness: 115 (+/10%) nm Crushers & Grinders Polishing: both sides polishedIndium Tin Oxide (ITO) coated Glass Plates Dimension: 1" x 1" x 0. 7 mm Resistivity: 12 15 ohm sq Nominal ITO film thickness: 115 (+ 10%) nm Optical Transparency: > 78% @ 555nm Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater

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