orn.+ 0. 5 Deg Polished surface: Wafer surface is EPI polished via a special CMP procedure Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with wafer container Typical Properties:"> orn.+ 0. 5 Deg Polished surface: Wafer surface is EPI polished via a special CMP procedure Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with wafer container Typical Properties:"> orn.+ 0. 5 Deg Polished surface: Wafer surface is EPI polished via a special CMP procedure Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with wafer container Typical Properties:"> Al2O3 - Sapphire Wafer 1" x0.5 mm , A plane (11-20), 2sp Target A-Z The package comes included with – golvvardarna.se

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Al2O3 - Sapphire Wafer 1" x0.5 mm , A plane (11-20), 2sp Target A-Z The package comes included with

$132.25

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Description

The package comes included with complete accessories for immediate use

T 27-71 mm

1mm (Width) x  0

Use in GSL-1700X

Al2O3 - Sapphire Wafer 1" x0.5 mm , A plane (11-20), 2sp Target A-Z The package comes included withFeatures: A plane (11 20) sapphire wafer is being used extensively as a substrate for III V nitrides and magnetic epitaxial films due to its better lattice mismatch Wafer size: 1" dia x 0. 4 0. 5 mm thickness Orientaion: A plane <11 20> orn.+ 0. 5 Deg Polished surface: Wafer surface is EPI polished via a special CMP procedure Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with wafer container Typical Properties:

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