M03800 - SEMI M38 - 鏡面リクレイムシリコンウェーハの仕様 Revision:SEMI M38-0312 - Superseded This includes process

This includes process

It is hereby mentioned that a measured value (for example the mean

The purpose of this Document is to provide specification for chlorine (Cl2) that is used in the semiconductor industry

This Specification provides for a standardized OC location in support of future unification of the OC cut shape as well as location

M03800 - SEMI M38 - 鏡面リクレイムシリコンウェーハの仕様 Revision:SEMI M38-0312 - Superseded This includes processglobal Silicon Wafer Committee20061121global Audits and Reviews Subcommittee20072www. semi. org20073CD ROM1999920063 300 mm 1 Referenced SEMI Standards SEMI M1 Specifications for Polished Monocrystalline Silicon Wafers SEMI M8 Specification for Polished Monocrystalline Silicon Test Wafers SEMI M18 Format for Silicon Wafer Specification Form for Order Entry