M04300 - SEMI M43 - Guide for Reporting Wafer Nanotopography Revision:SEMI M43-0418 (Reapproved 0923) - Current This Standard covers only load

This Standard covers only load ports for reticle SMIF pods (RSPs) as specified in SEMI E100

The purpose of this Standard is to introduce Wafer Job (WJ) in order to observe and/or control a wafer (and its information including context information from related actions such as pre-processing

Only mixed virgin HPIX resin is used for the testing within this Guide

can be used to facilitate inclusion of such additional physical properties and suitable test methods as may be required in the Specification

M04300 - SEMI M43 - Guide for Reporting Wafer Nanotopography Revision:SEMI M43-0418 (Reapproved 0923) - Current This Standard covers only loadThis Guide provides a framework for reporting of nanotopography surface features on silicon wafers. This Guide addresses reporting the characterization of nanotopography surface features found on wafer surfaces. Nanotopography is the non planar deviation of the whole front wafer surface within a spatial wavelength range of approximately 0. 2 to 20 mm and within the fixed quality area (FQA). Typical examples include dips, bumps or waves on the wafer