M06300 - SEMI M63 - 化合物半導体エピタキシャルウェーハに使用するサファイア基板の仕様 Revision:SEMI M63-0306 - Superseded The PSEM consists of equipment

The PSEM consists of equipment characteristics and behaviors that apply to this class of equipment and are required to be implemented in addition to the fundamental requirements and additional capabilities specified in SEMI E30 (GEM)

within semiconductor device manufacturing facilities

color appearance model) in this Standard

SEMI MF657 — Test Method for Measuring Warp and Total Thickness Variation on Silicon Slices and Wafers by a Noncontact Scanning Method

M06300 - SEMI M63 - 化合物半導体エピタキシャルウェーハに使用するサファイア基板の仕様 Revision:SEMI M63-0306 - Superseded The PSEM consists of equipmentglobal Compound Semiconductor Materials Committee2006116global Audits and Reviews Subcommittee20062www. semi. org20063CD ROM E20068R2 2 Referenced SEMI Standards None.