M06800 - SEMI M68 - 測定した高さデータ配列から曲率法ZDDを使ってウェーハのエッジ近傍形状を決定するための作業方法 Revision:SEMI M68-1109 - Superseded due to the migration to

due to the migration to large substrate sizes in FPD production

SEMI E125-1104 (technical revision)

1-0600E (editorial revision)

Establishment of other related terminologies will follow

M06800 - SEMI M68 - 測定した高さデータ配列から曲率法ZDDを使ってウェーハのエッジ近傍形状を決定するための作業方法 Revision:SEMI M68-1109 - Superseded due to the migration toglobal Silicon Wafer Committee200994global Audits and Reviews Subcommittee200910www. semi. org200911CD ROM20073200811 ZDD Referenced SEMI Standards SEMI M1 Specifications for Polished Monocrystalline Silicon Wafers SEMI M20 Practice for Establishing a Wafer Coordinate System SEMI M59 Terminology for Silicon Technology SEMI M67 Practice for Determining Wafer Near Edge Geometry from a Measured Thickness Data Array Using the ESFQR, ESFQD and ESBIR