P00100 - SEMI P1 - Specification for Hard Surface Photomask Substrates Revision:SEMI P1-0708E - Inactive orgで，そして2009年7月にCD-ROMで入手可能となる。

orgで，そして2009年7月にCD-ROMで入手可能となる。

SEMI F41 — Guide for Qualification of a Bulk Chemical Distribution System Used in Semiconductor Processing

前方の支持機構（フロントリテイニングフィーチャ）

The Test Method is based on a light sectioning technique (see Related Information 1) where patterns of line segments or spots of light are projected onto a wafer surface and saw marks as well as the waviness peaks and valleys are oriented perpendicular to the direction of wafer transport

P00100 - SEMI P1 - Specification for Hard Surface Photomask Substrates Revision:SEMI P1-0708E - Inactive orgで，そして2009年7月にCD-ROMで入手可能となる。NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. NOTICE: This Document was completely rewritten in 2008. This Specification covers the general requirements of the glass substrate for hard surface photomasks. This Document covers square photomasks up to 7 inches in length.