P04200 - SEMI P42 - Specification of Reticle Data for Automatic Recipe Transfer to Wafer Exposure System StdPbc-0812 SEMI G82-0301E (Reapproved 0706)

SEMI G82-0301E (Reapproved 0706)

1  This Standard partially specifies the FOUPs used to transport and store 300 mm wafers in an IC manufacturing facility

参考までに，米国で通常使われている単位が2インチおよび3インチウェーハには用いられ，SI（メートル）単位が100 mm以上のウェーハには使われている。

semiconductor manufacturers

P04200 - SEMI P42 - Specification of Reticle Data for Automatic Recipe Transfer to Wafer Exposure System StdPbc-0812 SEMI G82-0301E (Reapproved 0706)This specification was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on January 9, 2004. Initially available at www. semi. org February 2004; to be published March 2004. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not